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US Patent 10067416 Ebeam three beam aperture array

Patent 10067416 was granted and assigned to Intel on September, 2018 by the United States Patent and Trademark Office.

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Patent abstract

Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.

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