US Patent 10817999 Image-based overlay metrology and monitoring using through-focus imaging
Patent 10817999 was granted and assigned to KLA on October, 2020 by the United States Patent and Trademark Office.
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Patent Number
108179990
Date of Patent
October 27, 2020
0Patent Application Number
160340930
Date Filed
July 12, 2018
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US Patent 10817999 Image-based overlay metrology and monitoring using through-focus imaging
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
10817999
Date of patent
October 27, 2020
Patent application number
16034093
Date Filed
July 12, 2018
Patent primary examiner
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