Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bob Streefkerk0
Bernard Gellrich0
Erik Roelof Loopstra0
Christiaan Alexander Hoogendam0
Andreas Wurmbrand0
Date of Patent
May 12, 2009
0Patent Application Number
120107050
Date Filed
January 29, 2008
0Patent Primary Examiner
Patent abstract
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
