List of Carl Zeiss SMT patents

Patents where

Current Assignee

Name

Carl Zeiss SMT

Name	Description	Patent Applicant	Current Assignee	Patent Jurisdiction	Patent Number	Date of Patent
‌ US Patent 11619882 Method and apparatus for characterizing a microlithographic mask	Patent 11619882 was granted and assigned to Carl Zeiss SMT on April, 2023 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11619882	April 4, 2023
‌ US Patent 7586113 EUV illumination system	Patent 7586113 was granted and assigned to Carl Zeiss SMT on September, 2009 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7586113	September 8, 2009
‌ US Patent 7489441 Monocrystalline optical component with curved surface and multilayer coating	Patent 7489441 was granted and assigned to Carl Zeiss SMT on February, 2009 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7489441	February 10, 2009
‌ US Patent 7352452 Method and apparatus for setting optical imaging properties by means of radiation treatment	Patent 7352452 was granted and assigned to Carl Zeiss SMT on April, 2008 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7352452	April 1, 2008
‌ US Patent 7457043 Projection exposure system	Patent 7457043 was granted and assigned to Carl Zeiss SMT on November, 2008 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7457043	November 25, 2008
‌ US Patent 11415895 Compensation of creep effects in an imaging device	Patent 11415895 was granted and assigned to Carl Zeiss SMT on August, 2022 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11415895	August 16, 2022
‌ US Patent 7196841 Lighting system, particularly for use in extreme ultraviolet (EUV) lithography	Patent 7196841 was granted and assigned to Carl Zeiss SMT on March, 2007 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7196841	March 27, 2007
‌ US Patent 7511886 Optical beam transformation system and illumination system comprising an optical beam transformation system	Patent 7511886 was granted and assigned to Carl Zeiss SMT on March, 2009 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7511886	March 31, 2009
‌ US Patent 8194230 Projection objectives having mirror elements with reflective coatings	Patent 8194230 was granted and assigned to Carl Zeiss SMT on June, 2012 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	8194230	June 5, 2012
‌ US Patent 7301646 Device and method for the determination of imaging errors and microlithography projection exposure system	Patent 7301646 was granted and assigned to Carl Zeiss SMT on November, 2007 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7301646	November 27, 2007
‌ US Patent 8134716 Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methods	Patent 8134716 was granted and assigned to Carl Zeiss SMT on March, 2012 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	8134716	March 13, 2012
‌ US Patent 7417745 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry	Patent 7417745 was granted and assigned to Carl Zeiss SMT on August, 2008 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7417745	August 26, 2008
‌ US Patent 7355678 Projection system for EUV lithography	Patent 7355678 was granted and assigned to Carl Zeiss SMT on April, 2008 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7355678	April 8, 2008
‌ US Patent 7540983 Method of producing aspherical optical surfaces	Patent 7540983 was granted and assigned to Carl Zeiss SMT on June, 2009 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7540983	June 2, 2009
‌ US Patent 7283209 Illumination system for microlithography	Patent 7283209 was granted and assigned to Carl Zeiss SMT on October, 2007 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7283209	October 16, 2007
‌ US Patent 11366393 Support of an optical element	Patent 11366393 was granted and assigned to Carl Zeiss SMT on June, 2022 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11366393	June 21, 2022
‌ US Patent 7442908 Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate	Patent 7442908 was granted and assigned to Carl Zeiss SMT on October, 2008 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7442908	October 28, 2008
‌ US Patent 8004690 Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus	Patent 8004690 was granted and assigned to Carl Zeiss SMT on August, 2011 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	8004690	August 23, 2011
‌ US Patent 11650510 Projection optical unit for microlithography and method for producing a structured component	Patent 11650510 was granted and assigned to Carl Zeiss SMT on May, 2023 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11650510	May 16, 2023
‌ US Patent 7925284 Charged particle beam device	Patent 7925284 was granted and assigned to Carl Zeiss SMT on April, 2011 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7925284	April 12, 2011
‌ US Patent 11281114 Projection exposure apparatus for semiconductor lithography		Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11281114	March 22, 2022
‌ US Patent 10001631 Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element	Patent 10001631 was granted and assigned to Carl Zeiss SMT on June, 2018 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	10001631	June 19, 2018
‌ US Patent 7643149 Method of aligning an optical system	Patent 7643149 was granted and assigned to Carl Zeiss SMT on January, 2010 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	7643149	January 5, 2010
‌ US Patent 9013684 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus	Patent 9013684 was granted and assigned to Carl Zeiss SMT on April, 2015 by the United States Patent and Trademark Office.		Carl Zeiss SMT	United States Patent and Trademark Office	9013684	April 21, 2015
‌ US Patent 11526089 Compensation of creep effects in an imaging device	Patent 11526089 was granted and assigned to Carl Zeiss SMT on December, 2022 by the United States Patent and Trademark Office.	Carl Zeiss SMT	Carl Zeiss SMT	United States Patent and Trademark Office	11526089	December 13, 2022

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