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H01L 21/76897

{Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step }

OverviewStructured DataIssuesContributors
Is a
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Patent classification
Classification Type
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Cooperative Patent Classification
Parent Classification
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H01L 21/768
Official Website
data.epo.org/linked-d...L21-76897

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