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H01L 2221/1047

Formation and after-treatment of dielectrics the dielectric comprising air gaps the air gaps being formed by pores in the dielectric

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Edits on 16 Mar, 2022
"Entity importer update"
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Golden AI
edited on 16 Mar, 2022
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H01L 2221/1042
Edits on 5 Mar, 2022
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Golden AI
created this topic on 5 Mar, 2022
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 H01L 2221/1047

Formation and after-treatment of dielectrics the dielectric comprising air gaps the air gaps being formed by pores in the dielectric

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Cooperative Patent Classification
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http://data.epo.org/linked-data/def/cpc/H01L2221-1047

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