Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 26, 2018
Patent Application Number
14388914
Date Filed
March 26, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
Provide an apparatus for selective epitaxial growth. The apparatus for selective epitaxial growth, the apparatus comprising, a process tube comprising an inner tube in which a substrate stack unit for receiving a plurality of substrates is accommodated and an outer tube surrounding the inner tube, a heater assembly disposed to surround the process tube and a side nozzle unit vertically disposed inside the process tube, wherein the side nozzle unit comprises first and second side nozzles for respectively spraying an etching gas and a depo gas for the selective epitaxial growth.
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