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US Patent 10017876 Chemical vapor deposition flow inlet elements and methods

Patent 10017876 was granted and assigned to Veeco on July, 2018 by the United States Patent and Trademark Office.

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Patent abstract

A flow inlet element for a chemical vapor deposition reactor is formed from a plurality of elongated tubular elements extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane extending through the axis.

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