Golden has been acquired by ComplyAdvantage.Read about it here ⟶

‌

US Patent 10023674 Monomer, polymer, resist composition, and patterning process

Overview Structured Data Issues Contributors Activity

Is a

0

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

0

Patent Number

Patent Inventor Names

Masayoshi Sagehashi0

Teppei Adachi0

Jun Hatakeyama0

Kazuhiro Katayama0

Koji Hasegawa0

Masahiro Fukushima0

Date of Patent

July 17, 2018

0

Patent Application Number

154262270

Date Filed

February 7, 2017

0

Patent Citations Received

US Patent 11353790 Resin, resist composition and method for producing resist pattern

US Patent 11656548 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

0

US Patent 11500288 Resin, resist composition and method for producing resist pattern

Patent Primary Examiner

Amanda C. Walke

0

Patent abstract

A monomer having a substituent group capable of polarity switch under the action of acid is provided. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high resolution and etch resistance which is insoluble in alkaline developer.

Timeline

No Timeline data yet.

Further Resources

Title

Author

Link

Type

Date

No Further Resources data yet.

References

Find more entities like US Patent 10023674 Monomer, polymer, resist composition, and patterning process

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.

Open Query Tool

Golden Query Tool