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US Patent 10047435 Dual selective deposition

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Date Filed
April 15, 2015
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Date of Patent
August 14, 2018
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Patent Application Number
14687833
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Patent Citations Received
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US Patent 11993842 Selective deposition of metal oxide by pulsed chemical vapor deposition
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US Patent 11501966 Selective layer formation using deposition and removing
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US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
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US Patent 11326254 Protecting an interior of a gas container with an ALD coating
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US Patent 11804373 Selective layer formation using deposition and removing
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US Patent 11387107 Deposition of organic films
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US Patent 11396701 Passivation against vapor deposition
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US Patent 11430656 Deposition of oxide thin films
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US Patent 11830732 Selective passivation and selective deposition
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US Patent 11446699 Vapor phase deposition of organic films
•••
Patent Inventor Names
Marko Tuominen
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Antti Niskanen
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Eva Tois
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Hannu Huotari
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Raija H. Matero
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Suvi P. Haukka
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Viljami J. Pore
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10047435
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Patent Primary Examiner
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Elizabeth A Burkhart
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