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US Patent 10047435 Dual selective deposition
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Patent
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Date Filed
April 15, 2015
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Date of Patent
August 14, 2018
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Patent Application Number
14687833
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Patent Citations Received
US Patent 11993842 Selective deposition of metal oxide by pulsed chemical vapor deposition
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US Patent 11501966 Selective layer formation using deposition and removing
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US Patent 11326254 Protecting an interior of a gas container with an ALD coating
US Patent 11804373 Selective layer formation using deposition and removing
US Patent 11387107 Deposition of organic films
US Patent 11396701 Passivation against vapor deposition
US Patent 11430656 Deposition of oxide thin films
US Patent 11830732 Selective passivation and selective deposition
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US Patent 11446699 Vapor phase deposition of organic films
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Patent Inventor Names
Marko Tuominen
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Antti Niskanen
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Eva Tois
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Hannu Huotari
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Raija H. Matero
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Suvi P. Haukka
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Viljami J. Pore
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10047435
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Patent Primary Examiner
Elizabeth A Burkhart
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