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US Patent 10054430 Overlapping pattern projector

Patent 10054430 was granted and assigned to Apple (company) on August, 2018 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Apple (company)
Apple (company)
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Current Assignee
Apple (company)
Apple (company)
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
100544300
Patent Inventor Names
Zafrir Mor0
Boris Morgenstein0
Date of Patent
August 21, 2018
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Patent Application Number
150571400
Date Filed
March 1, 2016
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Patent Citations Received
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US Patent 11875592 Elongated fingerprint sensor
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US Patent 12126145 Bottom-emitting vertical cavity surface emitting laser array with integrated directed beam diffuser
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US Patent 12093359 Electronic device having a sealed biometric input system
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US Patent 10650540 Determining sparse versus dense pattern illumination
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US Patent 10971900 Vertical-cavity surface-emitting laser, structured light module and method for light projection and terminal
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US Patent 11921254 Optical seismic surveying system
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Patent Primary Examiner
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Jacob R Stern
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Patent abstract

An optoelectronic device includes a semiconductor substrate, an array of optical emitters arranged on the substrate in a two-dimensional pattern, a projection lens and a diffractive optical element (DOE). The projection lens is mounted on the semiconductor substrate and is configured to collect and focus light emitted by the optical emitters so as to project optical beams containing a light pattern corresponding to the two-dimensional pattern of the optical emitters on the substrate. The DOE is mounted on the substrate and is configured to produce and project multiple overlapping replicas of the pattern.

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