US Patent 10099920 Scalable nucleic acid-based nanofabrication

The present disclosure relates to the alignment of moieties (e.g., nanoparticles and/or nanowires) into prescribed architectures on two- and/or three-dimensional substrates (e.g., nucleic acid nanostructures/crystals). The present disclosure also relates to a nucleic acid (e.g., DNA) lithography method that includes, in some embodiments, adsorbing a bare nucleic acid nanostructure onto a surface of a substrate, and etching the surface of the substrate containing the bare nucleic acid nanostructure, thereby producing a patterned substrate.