US Patent 10103517 High reliability etched-facet photonic devices
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Patent abstract
Semiconductor photonic device surfaces are covered with a dielectric or a metal protective layer. The protective layer covers the entire device, including regions near facets at active regions, to prevent bare or unprotected semiconductor regions, thereby to form a very high reliability etched facet photonic device.
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Patent Inventor Names
Alex A. Behfar0
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US Patent 10103517 High reliability etched-facet photonic devices
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Is a
Patent jurisdiction
Patent number
10103517
Date of patent
October 16, 2018
Patent application number
14296162
Date Filed
June 4, 2014
Patent primary examiner
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