Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hung Cho Wang0
Harry-Hak-Lay Chuang0
Jiunyu Tsai0
Tsun Chung Tu0
Date of Patent
October 23, 2018
0Patent Application Number
156831480
Date Filed
August 22, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for manufacturing a semiconductor structure is disclosed. The method includes: providing a substrate; forming an MRAM structure over the substrate; forming a first dielectric layer over the MRAM structure; forming a stop layer over the first dielectric layer; forming a second dielectric layer over the stop layer; and removing the second dielectric layer, the stop layer and at least a portion of the first dielectric layer through a planarization operation without exposing a top electrode of the MRAM structure. Associated methods are also disclosed.
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