US Patent 10163722 Method and structure for FinFet isolation

A semiconductor device includes a substrate; first and second fins over the substrate and extending lengthwise generally along a first direction; first and second gate stacks over the substrate and the first and second fins respectively; and a first isolation structure disposed between the first and second fins and extending lengthwise generally along a second direction perpendicular to the first direction, wherein the first isolation structure is adjacent to a first source/drain (S/D) region in the first fin and adjacent to a second S/D region in the second fin.