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US Patent 10170332 FinFET thermal protection methods and related structures

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
June 30, 2014
Date of Patent
January 1, 2019
Patent Application Number
14319610
Patent Citations Received
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US Patent 11251284 Dummy gate cutting process and resulting gate structures
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US Patent 11973144 Method of manufacturing a semiconductor and a semiconductor device
0
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US Patent 11757019 Dummy gate cutting process and resulting gate structures
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US Patent 10431686 Integrated circuit (IC) employing a channel structure layout having an active semiconductor channel structure(s) and an isolated neighboring dummy semiconductor channel structure(s) for increased uniformity
0
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US Patent 10629443 Bottom source/drain silicidation for vertical field-effect transistor (FET)
Patent Inventor Names
Yu-Lien Huang
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10170332
Patent Primary Examiner
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Dale E Page

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