Patent 10190892 was granted and assigned to Mitutoyo on January, 2019 by the United States Patent and Trademark Office.
A scale is provided with a reference mark and an incremental pattern. A detection head is relatively movable in a measurement direction with respect to the scale, and detects a light intensity distribution of diffracted beams if beams radiated onto the scale are diffracted by the reference mark, and outputs the detection result. A signal processing unit detects a reference position based on a position in the light intensity distribution where light intensity is lower than a predetermined value. The reference position has a plurality of pattern areas having a plurality of patterns arranged with a predetermined pitch in the measurement direction. At least one pattern area of the plurality of pattern areas is disposed with an offset from a neighboring pattern area in the measurement direction.