Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tobin Kaufman-Osborn0
Keith Tatseun Wong0
Date of Patent
January 29, 2019
0Patent Application Number
154468160
Date Filed
March 1, 2017
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Implementations described herein generally relate to processes for the fabrication of semiconductor devices in which a self-assembled monolayer (SAM) is used to achieve selective area deposition. Methods described herein relate to alternating SAM molecule and hydroxyl moiety exposure operations which may be utilized to form SAM layers suitable for blocking deposition of subsequently deposited materials.
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