Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sirish K. Reddy0
Bart J. van Schravendijk0
Chunhai Ji0
Nader Shamma0
Date of Patent
January 29, 2019
0Patent Application Number
151502390
Date Filed
May 9, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Methods and apparatuses for multiple patterning using image reversal are provided. The methods may include depositing gap-fill ashable hardmasks using a deposition-etch-ash method to fill gaps in a pattern of a semiconductor substrate and eliminating spacer etching steps using a single-etch planarization method. Such methods may be performed for double patterning, multiple patterning, and two dimensional patterning techniques in semiconductor fabrication.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
