Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 5, 2019
Patent Application Number
15226233
Date Filed
August 2, 2016
Patent Citations Received
Patent Primary Examiner
Patent abstract
A device, structure, and method are provided whereby an insert layer is utilized to provide additional support for weaker and softer dielectric layer. The insert layer may be applied between two weaker dielectric layers or the insert layer may be used with a single layer of dielectric material. Once formed, trenches and vias are formed within the composite layers, and the insert layer will help to provide support that will limit or eliminate undesired bending or other structural motions that could hamper subsequent process steps, such as filling the trenches and vias with conductive material.
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