Patent attributes
A exhaust gas purification apparatus is provided with; a substrate having a wall-flow structure and including entry-side cells, exit-side cells, and a porous partition; a first catalyst region formed in small diameter pores having relatively small pore diameters among internal pores in the partition; and a second catalyst region formed in large diameter pores having relatively large pore diameters among the internal pores in the partition. The first catalyst region contains a support and any one or two species of precious metal selected from Pt, Pd, and Rh loaded on the support, while the second catalyst region contains a support and any one or two species of precious metal selected from Pt, Pd, and Rh loaded on the support and other than at least the precious metal present in the first catalyst region.
