US Patent 10217613 Plasma processing apparatus
Patent 10217613 was granted and assigned to Hitachi on February, 2019 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
September 23, 2016
0
Date of Patent
February 26, 2019
0
Patent Applicant
Patent Application Number
15273812
0
Patent Inventor Names
Takumi Tandou
0
Naoki Yasui
0
Tetsuo Kawanabe
0
Tsutomu Tetsuka
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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