US Patent 10236198 Methods for the continuous processing of substrates
Patent 10236198 was granted and assigned to Applied Materials on March, 2019 by the United States Patent and Trademark Office.
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Patent abstract
Methods of processing a plurality of substrates using a processing chamber with bottom and top openings and a plurality of processing slots are provided. A substrate positioned on a carrier is loaded into a first end of a processing chamber body through the bottom opening. The carrier is moved through a plurality of processing slots to a top opening at a second end of the chamber body and then removed from the processing chamber through the top opening.
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Patent Inventor Names
Banqiu Wu0
Jeonghoon Oh0
Li-Qun Xia0
Nag B. Patibandla0
Pravin K. Narwankar0
Ralf Hofmann0
Srinivas Satya0
Toshiaki Fujita0
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US Patent 10236198 Methods for the continuous processing of substrates
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Patent applicant
Current assignee
Patent jurisdiction
Patent number
10236198
Date of patent
March 19, 2019
Patent application number
15689550
Date Filed
August 29, 2017
Patent primary examiner
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