Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 19, 2019
Patent Application Number
15784445
Date Filed
October 16, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
Structures for a field-effect transistor and methods for forming a field-effect transistor. The structure includes a gate structure having a sidewall and a sidewall spacer arranged adjacent to the sidewall of the gate structure. The sidewall spacer includes an energy removal film material and one or more air gaps in the energy removal film material.
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