US Patent 10249541 Forming a hybrid channel nanosheet semiconductor structure

A method for fabricating a nanosheet semiconductor structure includes forming a first nanosheet field effect transistor (FET) structure having a first inner spacer comprised of a first material and a second nanosheet FET structure having second inner spacer comprised of a second material. The first material is different than the second material. The first nanosheet FET structure is formed by creating a first inner spacer formation within a first silicon germanium (SiGe) channel, wherein the first SiGe channel is comprised in a first channel region of a first FET region. The second nanosheet FET structure is formed by creating a second inner spacer formation within a second SiGe channel, wherein the second SiGe channel is comprised in a second channel region of a second FET region.