A power supply system includes a digital-to-analogue converter (DAC) configured to generate an analogue signal and an amplifier path on which the analogue signal is amplified to generate a high-frequency power signal to be provided to a plasma chamber for supplying a plasma process with high-frequency power. The DAC is configured to be connected to an arc detection device that is configured to monitor the plasma chamber for arcs and be controlled by the arc detection device to modify the analogue signal in response to detecting an occurrence of an arc.