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US Patent 10312120 Position and temperature monitoring of ALD platen susceptor

Patent 10312120 was granted and assigned to Applied Materials on June, 2019 by the United States Patent and Trademark Office.

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Patent attributes

Patent Applicant

Applied Materials

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Current Assignee

Applied Materials

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Kaushal Gangakhedkar0

Dmitry A. Dzilno0

Joseph Yudovsky0

Kevin Griffin0

Abraham Ravid0

Alex Minkovich0

Date of Patent

June 4, 2019

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Patent Application Number

147743770

Date Filed

March 14, 2014

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Patent Citations Received

US Patent 11827983 Apparatus and process for determining the distance between a glass substrate and a coater

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US Patent 11239100 Auto-calibration to a station of a process module that spins a wafer

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US Patent 10648788 Substrate distance monitoring

US Patent 11011398 Fume determination method, substrate processing method, and substrate processing equipment

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Patent Primary Examiner

Charlee J. C. Bennett

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Patent abstract

Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

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