Patent attributes
Techniques are described for controlling the power and/or matching the impedance of the output impedance of a high frequency power generator to the impedance of a load, in particular a plasma discharge. A control arrangement may include a control unit, to which a target value, an actual value, and a correction value is supplied, the control unit being set up to generate an adjustment value by taking into account the correction value. The control arrangement may also include a device for determining the correction value, to which a control value is supplied and which is set up to determine the correction value by taking into account the control value and a default value. In some embodiments, when the control value deviates from the default value, the correction value influences the control unit such that the actual value deviates from the target value in the adjusted state of the control unit.
