Patent attributes
A plasma generation device and/or a plurality of plasma generation modules are provided. Responsive to a first plasma generation module of the plurality of plasma generation modules being attached to the plasma generation device, the plasma generation device is configured to supply a first voltage to a first electrode of the first plasma generation module and conduct process gas from a tank to the first plasma generation module in order to generate a first type of plasma at the first plasma generation module. Alternatively and/or additionally, responsive to a second plasma generation module of the plurality of plasma generation modules being attached to the plasma generation device, the plasma generation device is configured to supply a second voltage to a second electrode of the second plasma generation module in order to generate a second type of plasma at the second plasma generation module.