Patent attributes
An exhaust gas purification device of the present invention is provided with: a substrate of wall flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer, provided inside the partition wall and disposed in an upstream portion of the substrate including an exhaust gas inflow end section; and a downstream catalyst layer, provided inside the partition wall and disposed in a downstream portion of the substrate including an exhaust gas outflow end section. The upstream catalyst layer and the downstream catalyst layer each contain a carrier and at least one noble metal from among Pt, Pd and Rh, supported on the carrier. The noble metal in the upstream catalyst layer and the noble metal in the downstream catalyst layer are different from each other.
