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US Patent 10366878 Selective deposition through formation of self-assembled monolayers

Patent 10366878 was granted and assigned to Applied Materials on July, 2019 by the United States Patent and Trademark Office.

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Patent abstract

Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include net chemisorption of a self-assembled monolayer on the second surface to prevent deposition of the film on the second surface.

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Patent Inventor Names
David Thompson0
Jessica Sevanne Kachian0
Tobin Kaufman-Osborn0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=103668780
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Applied Materials
Applied Materials
0
Current Assignee
Applied Materials
Applied Materials
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
103668780
Date of Patent
July 30, 2019
0
Patent Application Number
155879970
Date Filed
May 5, 2017
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=103668780
Patent Citations Received
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US Patent 10643840 Selective deposition defects removal by chemical etch
0
Patent Primary Examiner
‌
Angel Roman, Jr.
0
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10366878
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Patent citations received
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US Patent 10643840 Selective deposition defects removal by chemical etch
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 US Patent 10366878 Selective deposition through formation of self-assembled monolayers

Infobox
Is a
Patent
Patent
Patent applicant
Applied Materials
Applied Materials
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10366878
Date of patent
July 30, 2019
Patent application number
15587997
Date Filed
May 5, 2017
Patent primary examiner
‌
Angel Roman, Jr.

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