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US Patent 10395900 Plasma processing apparatus

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
January 25, 2017
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Date of Patent
August 27, 2019
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Patent Application Number
15415403
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Patent Citations
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US Patent 10249511 Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus
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US Patent 10163606 Plasma reactor with highly symmetrical four-fold gas injection
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US Patent 10147588 System and method for increasing electron density levels in a plasma of a substrate processing system
Patent Citations Received
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US Patent 11446714 Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method
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US Patent 11605529 Plasma processing apparatus
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US Patent 11772138 Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method
Patent Inventor Names
Yun Kwang Jeon
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Doug Yong Sung
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Hak Young Kim
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Hwa Jun Jung
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Jong Woo Sun
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Jung Pyo Hong
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Yong Ho Lim
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10395900
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Patent Primary Examiner
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Rudy Zervigon
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