US Patent 10415577 Deposition substance monitoring device and vacuum pump
Patent 10415577 was granted and assigned to Shimadzu Corp. on September, 2019 by the United States Patent and Trademark Office.
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Patent abstract
A deposition substance monitoring device of a vacuum pump for rotatably driving a rotor by a motor to exhaust gas, comprises: a state determination section configured to determine whether or not the vacuum pump is in a predetermined exhaust state; and a deposition amount determination section configured to receive a deposition amount indicator for an amount of a deposition substance in the pump to determine as excessive deposition when the deposition amount indicator in the predetermined exhaust state is equal to or greater than an acceptable deposition threshold.
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Patent Inventor Names
Tetsuya Tsubokawa0
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Official Website
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
104155770
Date of Patent
September 17, 2019
0Patent Application Number
156948150
Date Filed
September 3, 2017
0Official Website
Patent Citations Received
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US Patent 10415577 Deposition substance monitoring device and vacuum pump
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
10415577
Date of patent
September 17, 2019
Patent application number
15694815
Date Filed
September 3, 2017
Patent primary examiner
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