Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 17, 2019
Patent Application Number
15443681
Date Filed
February 27, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.
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