Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 17, 2019
Patent Application Number
15136238
Date Filed
April 22, 2016
Patent Citations Received
Patent Primary Examiner
Patent abstract
A fin-shaped field effect transistor (finFET) device comprising includes a substrate, an insulating layer displaced over the substrate, and a fin. The device also includes a gate formed over the fin, the gate including: a gate stack; and a high-k dielectric on opposing side of the gate stack. The device further includes metallic source and drain regions formed over the fin and on opposing sides of the gate.
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