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US Patent 10418491 Oxide semiconductor film and semiconductor device
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Patent
Date Filed
December 19, 2017
Date of Patent
September 17, 2019
Patent Application Number
15846518
Patent Citations Received
US Patent 12119408 Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
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US Patent 12062405 Semiconductor device
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US Patent 12062724 Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
0
US Patent 11489077 Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
US Patent 10998449 Oxide semiconductor film and semiconductor device
US Patent 11652110 Metal oxide film and method for forming metal oxide film
0
US Patent 11923204 Manufacturing method of semiconductor device comprising oxide semiconductor
0
US Patent 11967648 Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
0
US Patent 11978742 Metal oxide film and method for forming metal oxide film
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10418491
Patent Primary Examiner
Phuc T. Dang
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