US Patent 10438819 Plasma processing apparatus and plasma processing method
Patent 10438819 was granted and assigned to Tokyo Electron on October, 2019 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
September 29, 2017
Date of Patent
October 8, 2019
Patent Applicant
Patent Application Number
15720768
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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