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US Patent 10443123 Dual selective deposition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
August 10, 2018
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Date of Patent
October 15, 2019
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Patent Application Number
16100855
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Patent Citations
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US Patent 10041166 Reaction chamber passivation and selective deposition of metallic films
Patent Citations Received
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US Patent 11993842 Selective deposition of metal oxide by pulsed chemical vapor deposition
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US Patent 11501966 Selective layer formation using deposition and removing
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US Patent 11608557 Simultaneous selective deposition of two different materials on two different surfaces
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US Patent 11643720 Selective deposition of silicon oxide on metal surfaces
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US Patent 11326254 Protecting an interior of a gas container with an ALD coating
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US Patent 11804373 Selective layer formation using deposition and removing
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US Patent 11387107 Deposition of organic films
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US Patent 11396701 Passivation against vapor deposition
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US Patent 11430656 Deposition of oxide thin films
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US Patent 11830732 Selective passivation and selective deposition
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•••
Patent Inventor Names
Raija H. Matero
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Eva Tois
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Hannu Huotari
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Marko Tuominen
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Suvi P. Haukka
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Viljami J. Pore
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Antti Niskanen
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10443123
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Patent Primary Examiner
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Elizabeth A Burkhart
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