US Patent 10453697 Methods of measuring electrical characteristics during plasma etching
Patent 10453697 was granted and assigned to Skyworks Solutions, Inc. on October, 2019 by the United States Patent and Trademark Office.
Is a
Date Filed
August 23, 2018
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Date of Patent
October 22, 2019
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Patent Application Number
16110176
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Patent Inventor Names
Daniel Kwadwo Amponsah Berkoh
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Dean G. Scott
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Elena Becerra Woodard
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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