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US Patent 10473598 X-ray thin film inspection device

Patent 10473598 was granted and assigned to Rigaku on November, 2019 by the United States Patent and Trademark Office.

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Is a
Patent
Patent
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Patent attributes

Patent Applicant
Rigaku
Rigaku
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Current Assignee
Rigaku
Rigaku
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
104735980
Patent Inventor Names
Yoshiyasu Ito0
Hideaki Takahashi0
Akifusa Higuchi0
Asao Nakano0
Hiroshi Motono0
Katsutaka Horada0
Kazuhiko Omote0
Kiyoshi Ogata0
...
Date of Patent
November 12, 2019
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Patent Application Number
155188920
Date Filed
October 14, 2014
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Patent Citations Received
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US Patent 11992350 System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
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US Patent 11885755 X-ray sequential array wavelength dispersive spectrometer
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US Patent 11549895 System and method using x-rays for depth-resolving metrology and analysis
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US Patent 11592407 Systems, devices, and methods for x-ray fluorescence analysis of geological samples
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US Patent 11056308 System and method for depth-selectable x-ray analysis
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US Patent 11686692 High throughput 3D x-ray imaging system using a transmission x-ray source
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US Patent 11428651 System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
Patent Primary Examiner
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Don K Wong
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Patent abstract

An X-ray thin film inspection device of the present invention includes an X-ray irradiation unit 40 installed on a first rotation arm 32, an X-ray detector 50 installed on a second rotation arm 33, and a fluorescence X-ray detector 60 for detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unit 40 includes an X-ray optical element 43 comprising a confocal mirror for receiving X-rays radiated from an X-ray tube 42, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanism 46 for passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element 43.

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