US Patent 10474139 Substrate processing apparatus and substrate processing method

Disclosed is substrate processing apparatus including a plurality of processing units, each of which processes a substrate, and a controller that causes each of the processing units to execute a substrate processing. The controller is configured to cause a processing unit with a detected abnormality to execute an improvement processing based on abnormality detection information including a content of abnormality detected by a substrate surface measurement after causing the substrate processing to be performed in each of the processing units. The improvement processing is specified from improvement processing information in which the content of abnormality and the improvement processing are correlated with each other.