US Patent 10475813 Ferroelectric memory device and method of manufacturing the same

In an embodiment, a ferroelectric memory device includes a substrate having a source region and a drain region. The ferroelectric memory device includes a ferroelectric superlattice structure disposed on the substrate and having at least two kinds of different dielectric layers alternately stacked. Further, the ferroelectric memory device includes a gate electrode layer disposed on the superlattice structure.