Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kuan-Lun Cheng0
Chih-Hao Wang0
Kuo-Cheng Ching0
Date of Patent
November 19, 2019
Patent Application Number
15800287
Date Filed
November 1, 2017
Patent Citations Received
Patent Primary Examiner
Patent abstract
A semiconductor structure includes a substrate; a first semiconductor fin extending upwardly from the substrate; an isolation structure over the substrate and on sidewalls of the first semiconductor fin; a first epitaxial feature over the first semiconductor fin; a dielectric fin partially embedded in the isolation structure and projecting upwardly above the isolation structure; and first and second spacer features over the isolation structure. The first spacer feature is laterally between the first epitaxial feature and the dielectric fin. The first epitaxial feature is laterally between the first and second spacer features. Methods of forming the same are also disclosed.
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