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US Patent 10490547 IC with larger and smaller width contacts

Patent 10490547 was granted and assigned to Texas Instruments on November, 2019 by the United States Patent and Trademark Office.

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Contents

Is a
Patent
Patent

Patent attributes

Patent Applicant
Texas Instruments
Texas Instruments
Current Assignee
Texas Instruments
Texas Instruments
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10490547
Date of Patent
November 26, 2019
Patent Application Number
16053891
Date Filed
August 3, 2018
Patent Citations Received
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US Patent 11929131 Memory device degradation monitoring
0
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US Patent 12072376 Die-to-die connectivity monitoring
0
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US Patent 12013800 Die-to-die and chip-to-chip connectivity monitoring
0
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US Patent 12123908 Loopback testing of integrated circuits
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US Patent 12092684 Integrated circuit workload, temperature, and/or sub-threshold leakage sensor
0
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US Patent 11762013 Integrated circuit profiling and anomaly detection
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US Patent 11762789 Integrated circuit I/O integrity and degradation monitoring
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US Patent 11841395 Integrated circuit margin measurement and failure prediction device
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Patent Primary Examiner
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David Vu
Patent abstract

An integrated circuit (IC) includes a substrate having a semiconductor surface layer, at least one capacitor above the semiconductor surface layer including a bottom plate, a capacitor dielectric over the bottom plate, and a top plate over the capacitor dielectric, functional circuitry in the semiconductor surface layer includes a core region having transistors configured together with the capacitor for realizing at least one circuit function. Electrically conductive metal filled contacts are through the dielectric layer that contact the top plate, the bottom plate, and the core region, including a first filled contact hole having a first depth and a first width that reach the top capacitor plate, and second filled contact hole having a second depth and a second width that reach the core region. The second depth is deeper than the first depth, and the first width is at least ten (10) % larger than the second width.

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