Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dong-Yong Kim0
Min-Kyung Jang0
Jae Yun Ahn0
Chang-Young Hong0
Eui-Hyun Ryu0
Date of Patent
December 24, 2019
0Patent Application Number
151426580
Date Filed
April 29, 2016
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
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