US Patent 10527955 Lithographic apparatus and device manufacturing method
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Patent abstract
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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Patent Inventor Names
Aleksey Yurievich Kolesnychenko0
Bernardus Antonius Slaghekke0
Bob Streefkerk0
Christiaan Alexander Hoogendam0
Erik Roelof Loopstra0
Erik Theodorus Maria Bijlaart0
Helmar Van Santen0
Jeroen Johannes Sophia Maria Mertens0
Johannes Catharinus Hubertus Mulkens0
Patricius Aloysius Jacobus Tinnemans0
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US Patent 10527955 Lithographic apparatus and device manufacturing method
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Is a
Patent jurisdiction
Patent number
10527955
Date of patent
January 7, 2020
Patent application number
16369721
Date Filed
March 29, 2019
Patent primary examiner
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