US Patent 10545323 Projection optical unit for EUV projection lithography
Patent 10545323 was granted and assigned to Carl Zeiss SMT on January, 2020 by the United States Patent and Trademark Office.
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Patent abstract
A projection optical unit for EUV projection lithography has a plurality of mirrors for imaging an object field into an image field with illumination light. At least one of the mirrors is an NI mirror and at least one of the mirrors is a GI mirror. A mirror dimension Dx of the at least one NI mirror in a plane of extent (xz) perpendicular to a plane of incidence (yz) satisfies the following relationship:4 LLWx/IWPVmax<Dx.
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Patent Number
105453230
Date of Patent
January 28, 2020
0Patent Application Number
162225120
Date Filed
December 17, 2018
0Patent Citations Received
Patent Primary Examiner
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
105453230
Date of Patent
January 28, 2020
0Patent Application Number
162225120
Date Filed
December 17, 2018
0Patent Citations Received
Patent Primary Examiner
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US Patent 10545323 Projection optical unit for EUV projection lithography
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
10545323
Date of patent
January 28, 2020
Patent application number
16222512
Date Filed
December 17, 2018
Patent primary examiner
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