US Patent 10580779 Vertical transistor static random access memory cell

A memory cell includes vertical transistors including first and second pass gate (PG) transistors, first and second pull-up (PU1 and PU2) transistors, and first and second pull-down (PD1 and PD2) transistors. A first bottom electrode connects bottom source/drain (SD) regions of PU1 and PU2. A second bottom electrode connects bottom SD regions of PD1 and PD2. A first shared contact connects the top SD region of PU2 to the gate structure of PU1. A second shared contact connects the top SD region of PD1 to the gate structure of PD2. A first top electrode is connected to the top SD regions of PG1, PU1 and the second shared contact to define a first storage node of the memory cell. A second top electrode is connected to the top SD regions of PG2, PU2 and the first shared contact to define a second storage node of the memory cell.