US Patent 10591425 X-ray diffraction measurement method and apparatus

An X-ray diffraction measurement method includes an arranging step of arranging a shielding plate and a two-dimensional detector on an outgoing optical axis, and a calculating step of calculating a diffraction profile indicating an X-ray intensity with respect to a diffraction angle of the object to be measured, on the basis of a two-dimensional X-ray image detected by the two-dimensional detector. In the arranging step, the shielding plate is arranged in a manner so that the slit is inclined at least in a direction about the outgoing optical axis with respect to an orthogonal direction which is orthogonal to both the incident optical axis and the outgoing optical axis.