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US Patent 10591818 Nadic anhydride polymers and photosensitive compositions derived therefrom

Patent 10591818 was granted and assigned to Promerus Llc on March, 2020 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
‌
Promerus Llc
Current Assignee
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Promerus Llc
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10591818
Patent Inventor Names
Brian Knapp0
Cheryl Burns0
Date of Patent
March 17, 2020
Patent Application Number
15662372
Date Filed
July 28, 2017
Patent Citations Received
0
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US Patent 11746166 UV active derivatives of pd(AcAc)
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US Patent 11860537 Positive type photosensitive siloxane composition and cured film formed by using the same
0
Patent Primary Examiner
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John S. Chu
Patent abstract

Various vinyl addition polymers of nadic anhydride are disclosed. Examples of such polymers include copolymers and terpolymers of nadic anhydride with a wide variety of norbornene-type monomers. The nadic anhydride polymers are found to be useful in forming a wide variety of photosensitive compositions, both positive and negative, which are capable of forming high resolution imagable films exhibiting excellent dielectric properties (low-k) and thermal properties, and thus are useful in the fabrication of a variety of microelectronic and optoelectronic devices, among others.

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